Rapid Thermal And Integrated Processing
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Advances In Rapid Thermal And Integrated Processing
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Author : F. Roozeboom
language : en
Publisher: Springer Science & Business Media
Release Date : 1996-03-31
Advances In Rapid Thermal And Integrated Processing written by F. Roozeboom and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-03-31 with Science categories.
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Advances In Rapid Thermal And Integrated Processing
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Author : F. Roozeboom
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Advances In Rapid Thermal And Integrated Processing written by F. Roozeboom and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Science categories.
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Rapid Thermal And Integrated Processing
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Author :
language : en
Publisher:
Release Date : 1998
Rapid Thermal And Integrated Processing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998 with Rapid thermal processing categories.
Rapid Thermal And Integrated Processing V Volume 429
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Author : J. C. Gelpey
language : en
Publisher:
Release Date : 1996-10-14
Rapid Thermal And Integrated Processing V Volume 429 written by J. C. Gelpey and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-10-14 with Technology & Engineering categories.
This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
Rapid Thermal And Integrated Processing Vii
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Author : Materials Research Society
language : en
Publisher:
Release Date : 1998
Rapid Thermal And Integrated Processing Vii written by Materials Research Society and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998 with Chemical vapor deposition categories.
Rapid Thermal And Integrated Processing Iii Volume 342
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Author : Jimmie J. Wortman
language : en
Publisher:
Release Date : 1994-08-02
Rapid Thermal And Integrated Processing Iii Volume 342 written by Jimmie J. Wortman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994-08-02 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advances In Rapid Thermal And Integrated Processing
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Author : F. Roozeboom
language : en
Publisher:
Release Date : 2014-01-15
Advances In Rapid Thermal And Integrated Processing written by F. Roozeboom and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-01-15 with categories.
Rapid Thermal And Other Short Time Processing Technologies
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 2000
Rapid Thermal And Other Short Time Processing Technologies written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.
The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.
Rapid Thermal And Related Processing Techniques
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Author : Rajendra Singh
language : en
Publisher:
Release Date : 1991
Rapid Thermal And Related Processing Techniques written by Rajendra Singh and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991 with Science categories.
Rapid Thermal And Integrated Processing
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Author :
language : en
Publisher:
Release Date : 1991
Rapid Thermal And Integrated Processing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991 with categories.