Rapid Thermal And Integrated Processing Iii Volume 342
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Rapid Thermal And Integrated Processing Iii Volume 342
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Author : Jimmie J. Wortman
language : en
Publisher:
Release Date : 1994-08-02
Rapid Thermal And Integrated Processing Iii Volume 342 written by Jimmie J. Wortman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994-08-02 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Intermetallic Matrix Composites Iii Volume 350
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Author : J. A. Graves
language : en
Publisher:
Release Date : 1994-09
Intermetallic Matrix Composites Iii Volume 350 written by J. A. Graves and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994-09 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advances In Rapid Thermal And Integrated Processing
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Author : F. Roozeboom
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Advances In Rapid Thermal And Integrated Processing written by F. Roozeboom and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Science categories.
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Scintillator And Phosphor Materials Volume 348
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Author : Marvin J. Weber
language : en
Publisher:
Release Date : 1994-11-25
Scintillator And Phosphor Materials Volume 348 written by Marvin J. Weber and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994-11-25 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Science And Technology Of Fullerene Materials Volume 359
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Author : Patrick Bernier
language : en
Publisher:
Release Date : 1995-04-05
Science And Technology Of Fullerene Materials Volume 359 written by Patrick Bernier and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995-04-05 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Metallization For Devices And Circuits Science Technology And Manufacturability
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Author : S. P. Murarka
language : en
Publisher:
Release Date : 1994
Advanced Metallization For Devices And Circuits Science Technology And Manufacturability written by S. P. Murarka and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Technology & Engineering categories.
Proceedings Of The Thirteenth International Conference On Chemical Vapor Deposition
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Author : Theodore M. Besmann
language : en
Publisher: The Electrochemical Society
Release Date : 1996
Proceedings Of The Thirteenth International Conference On Chemical Vapor Deposition written by Theodore M. Besmann and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Science categories.
Novel Forms Of Carbon Ii Volume 349
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Author : C. L. Renschler
language : en
Publisher:
Release Date : 1994-11-21
Novel Forms Of Carbon Ii Volume 349 written by C. L. Renschler and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994-11-21 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Modeling And Simulation Of Thin Film Processing Volume 389
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Author : David J. Srolovitz
language : en
Publisher:
Release Date : 1995-10-02
Modeling And Simulation Of Thin Film Processing Volume 389 written by David J. Srolovitz and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995-10-02 with Science categories.
A diverse set of materials science communities come together in this volume to review the extraordinary progress made in the development of computer simulation and modeling techniques for the prediction of film morphology, microstructure, composition, profile and structure. These techniques are rapidly moving out of the area of academic research and into technological and production design areas of thin-film-based industries. The book is loosely organized in ascending order of modeling-length scales - from atomic, up to the entire deposition reactor. Topics include: deposition and growth modeling; film morphology and topology; film microstructure; failure mechanisms; etching; process modeling and control and reactor-scale modeling.
Chemical Vapor Deposition Of Refractory Metals And Ceramics Iii Volume 363
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Author : Bernard M. Gallois
language : en
Publisher:
Release Date : 1995-04-05
Chemical Vapor Deposition Of Refractory Metals And Ceramics Iii Volume 363 written by Bernard M. Gallois and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995-04-05 with Science categories.
CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.