Rapid Thermal And Integrated Processing Iv Volume 470


Rapid Thermal And Integrated Processing Iv Volume 470
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Rapid Thermal And Integrated Processing Iv Volume 470


Rapid Thermal And Integrated Processing Iv Volume 470
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Author : Jeffrey C. Gelpey
language : en
Publisher: Materials Research Society
Release Date : 1998-01-09

Rapid Thermal And Integrated Processing Iv Volume 470 written by Jeffrey C. Gelpey and has been published by Materials Research Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-01-09 with Technology & Engineering categories.


The MRS proceedings series on rapid thermal processing (RTP) has become the predominant international forum for research in this exciting and fast-growing field. In particular, this book in the series clearly indicates that the science of RTP is increasingly better understood and that equipment simulation and engineering have matured. With the so-called 'second generation' equipment vendors are providing useful and production-worthy solutions to the most pertinent problems within RTP - temperature measurement and reproducability. For that reason, the issues of temperature calibration and metrology, along with the International Temperature Scale, are featured. The evaluation and modelling of furnace, mini-bath and single-wafer RTP furnaces as the thermal method of choice are also addressed. Interesting developments are reported in the processing of dielectrics. Applications outside the field of silicon semiconductors are also presented. Topics include: measurement; RTCVD; modelling and manufacturing; integrated processing; silicides; annealing and defects; dielectrics; and RTP of III-V materials and other novel applications.



Advances In Rapid Thermal Processing


Advances In Rapid Thermal Processing
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 1999

Advances In Rapid Thermal Processing written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Technology & Engineering categories.




Rapid Thermal And Integrated Processing V Volume 429


Rapid Thermal And Integrated Processing V Volume 429
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Author : J. C. Gelpey
language : en
Publisher:
Release Date : 1996-10-14

Rapid Thermal And Integrated Processing V Volume 429 written by J. C. Gelpey and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-10-14 with Technology & Engineering categories.


This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.



Rapid Thermal Annealing Chemical Vapor Deposition And Integrated Processing Volume 146


Rapid Thermal Annealing Chemical Vapor Deposition And Integrated Processing Volume 146
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Author : David Hodul
language : en
Publisher:
Release Date : 1989-11-03

Rapid Thermal Annealing Chemical Vapor Deposition And Integrated Processing Volume 146 written by David Hodul and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989-11-03 with Technology & Engineering categories.


The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.



Electrical Optical And Magnetic Properties Of Organic Solid State Materials Iv Volume 488


Electrical Optical And Magnetic Properties Of Organic Solid State Materials Iv Volume 488
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Author : John R. Reynolds
language : en
Publisher:
Release Date : 1998-05-06

Electrical Optical And Magnetic Properties Of Organic Solid State Materials Iv Volume 488 written by John R. Reynolds and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-05-06 with Technology & Engineering categories.


This book shows that research involving electrical, optical and magnetic properties of organic solid-state materials continues to grow both in scope and technological importance. Early studies of charge transport in conducting polymers have evolved from the elucidation of fundamental structure/function relationships to applications such as batteries, simple electrical devices such as diodes, chemical sensors, antistatic coatings, microwave and millimeter wave-absorbing materials, and photochromic devices. A particularly exciting evolution has been the discovery and development of organic light-emitting diodes (OLEDs) which appear to be nearing commercialization in an amazingly short period of time. This application is of particular interest because both electrical and optical properties must be considered.. Topics include: organic light-emitting materials and devices; photonic materials and devices; conducting and electroactive polymers and materials; molecular and supramolecular engineering; organic metals and magnetic materials and poster presentations.



Rapid Thermal And Integrated Processing


Rapid Thermal And Integrated Processing
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Author :
language : en
Publisher:
Release Date : 1997

Rapid Thermal And Integrated Processing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Rapid thermal processing categories.




Photovoltaics For The 21st Century


Photovoltaics For The 21st Century
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Author : Electrochemical Society. Energy Technology Division
language : en
Publisher: The Electrochemical Society
Release Date : 1999

Photovoltaics For The 21st Century written by Electrochemical Society. Energy Technology Division and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Technology & Engineering categories.




Rapid Thermal And Integrated Processing


Rapid Thermal And Integrated Processing
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Author :
language : en
Publisher:
Release Date : 1998

Rapid Thermal And Integrated Processing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998 with Rapid thermal processing categories.




Rapid Thermal And Integrated Processing Vii


Rapid Thermal And Integrated Processing Vii
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Author : Materials Research Society
language : en
Publisher:
Release Date : 1998

Rapid Thermal And Integrated Processing Vii written by Materials Research Society and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998 with Chemical vapor deposition categories.




Rapid Thermal Processing And Beyond Applications In Semiconductor Processing


Rapid Thermal Processing And Beyond Applications In Semiconductor Processing
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Author : Wielfried Lerch
language : en
Publisher: Trans Tech Publications Ltd
Release Date : 2008-03-24

Rapid Thermal Processing And Beyond Applications In Semiconductor Processing written by Wielfried Lerch and has been published by Trans Tech Publications Ltd this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-03-24 with Technology & Engineering categories.


Heat-treatment and thermal annealing are very common processing steps which have been employed during semiconductor manufacturing right from the beginning of integrated circuit technology. In order to minimize undesired diffusion, and other thermal budget-dependent effects, the trend has been to reduce the annealing time sharply by switching from standard furnace batch-processing (involving several hours or even days), to rapid thermal processing involving soaking times of just a few seconds. This transition from thermal equilibrium, to highly non-equilibrium, processing was very challenging and is still a field ripe for further development.