Rapid Thermal Processing For Future Semiconductor Devices

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Rapid Thermal Processing For Future Semiconductor Devices

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Author : H. Fukuda
language : en
Publisher: Elsevier
Release Date : 2003-04-02

Rapid Thermal Processing For Future Semiconductor Devices written by H. Fukuda and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-02 with Science categories.

This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices.This book covers the following areas: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.

Rapid Thermal Processing And Beyond Applications In Semiconductor Processing

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Author : Wielfried Lerch
language : en
Publisher: Trans Tech Publications Ltd
Release Date : 2008-03-24

Rapid Thermal Processing And Beyond Applications In Semiconductor Processing written by Wielfried Lerch and has been published by Trans Tech Publications Ltd this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-03-24 with Technology & Engineering categories.

Special topic volume with invited papers only

Rapid Thermal Processing Of Semiconductors

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Author : Victor E. Borisenko
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-22

Rapid Thermal Processing Of Semiconductors written by Victor E. Borisenko and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-22 with Technology & Engineering categories.

Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

Advances In Rapid Thermal And Integrated Processing

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Author : F. Roozeboom
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09

Advances In Rapid Thermal And Integrated Processing written by F. Roozeboom and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Science categories.

Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.

Comprehensive Semiconductor Science And Technology

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Author :
language : en
Publisher: Elsevier
Release Date : 2024-11-28

Comprehensive Semiconductor Science And Technology written by and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-11-28 with Technology & Engineering categories.

Semiconductors are at the heart of modern living. Almost everything we do, be it work, travel, communication, or entertainment, all depend on some feature of semiconductor technology. Comprehensive Semiconductor Science and Technology, Second Edition, Three Volume Set captures the breadth of this important field and presents it in a single source to the large audience who study, make, and use semiconductor devices. Written and edited by a truly international team of experts and newly updated to capture key advancements in the field, this work delivers an objective yet cohesive review of the semiconductor world.The work is divided into three sections, fully updated and expanded from the first edition. The first section is concerned with the fundamental physics of semiconductors, showing how the electronic features and the lattice dynamics change drastically when systems vary from bulk to a low-dimensional structure and further to a nanometer size. Throughout this section there is an emphasis on the full understanding of the underlying physics, especially quantum phenomena. The second section deals largely with the transformation of the conceptual framework of solid-state physics into devices and systems, which require the growth of high-purity or doped, bulk and epitaxial materials with low defect density and well-controlled electrical and optical properties. The third section is devoted to design, fabrication and assessment of discrete and integrated semiconductor devices. It will cover the entire spectrum of devices we see all around us, for telecommunications, computing, automation, displays, illumination and consumer electronics. - Provides a comprehensive global picture of the semiconductor world - Written and Edited by an international team of experts - Compiles the most important semiconductor knowledge into one comprehensive resource - Moves from fundamentals and theory to more advanced knowledge, such as applications, allowing readers to gain a deeper understanding of the field

Rapid Thermal And Other Short Time Processing Technologies Iii

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Author : Paul J. Timans
language : en
Publisher: The Electrochemical Society
Release Date : 2002

Rapid Thermal And Other Short Time Processing Technologies Iii written by Paul J. Timans and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Technology & Engineering categories.

Journal Of Research Of The National Institute Of Standards And Technology

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Author :
language : en
Publisher:
Release Date : 2006

Journal Of Research Of The National Institute Of Standards And Technology written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Measurement categories.

Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.

Coating Materials

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Author : Akarsh Verma
language : en
Publisher: Springer Nature
Release Date : 2023-07-12

Coating Materials written by Akarsh Verma and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-07-12 with Technology & Engineering categories.

This book comprehensively reviews assorted types of coatings, their applications, and various strategies employed by several scientists and researchers to fabricate them. Exclusively, the recent progress in computational strategies that are helpful to optimize the best suitable coating formulation before one goes for the real-time fabrication has been discussed in detail. And this book is also intended to shed light on the computational modeling techniques that are used in the characterization of various coating materials. It covers mechanisms, salient features, formulations, important aspects, and case studies of coatings utilized for various applications. The latest research in this area as well as possible avenues of future research is also highlighted to encourage the researchers.

Handbook Of Low And High Dielectric Constant Materials And Their Applications Two Volume Set

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Author : Hari Singh Nalwa
language : en
Publisher: Elsevier
Release Date : 1999-09-07

Handbook Of Low And High Dielectric Constant Materials And Their Applications Two Volume Set written by Hari Singh Nalwa and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-09-07 with Science categories.

Recent developments in microelectronics technologies have created a great demand for interlayer dielectric materials with a very low dielectric constant. They will play a crucial role in the future generation of IC devices (VLSI/UISI and high speed IC packaging). Considerable efforts have been made to develop new low as well as high dielectric constant materials for applications in electronics industries. Besides achieving either low or high dielectric constants, other materials' properties such as good processability, high mechanical strength, high thermal and environmental stability, low thermal expansion, low current leakage, low moisture absorption, corrosion resistant, etc., are of equal importance. Many chemical and physical strategies have been employed to get desired dielectric materials with high performance. This is a rapidly growing field of science--both in novel materials and their applications to future packing technologies. The experimental data on inorganic and organic materials having low or high dielectric constant remail scattered in the literature. It is timely, therfore, to consolidate the current knowledge on low and high dielectric constant materials into a sigle reference source. Handbook of Low and High Dielectric Constant Materials and Their Applications is aimed at bringing together under a sigle cover (in two volumes) all low and high dielectric constant materials currently studied in academic and industrial research covering all spects of inorgani an organic materials from their synthetic chemistry, processing techniques, physics, structure-property relationship to applications in IC devices. This book will summarize the current status of the field covering important scientific developments made over the past decade with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source for all those interested in low and high dielectric constant material.

Coupled Diffusion Of Impurity Atoms And Point Defects In Silicon Crystals

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Author : Oleg Velichko
language : en
Publisher: World Scientific
Release Date : 2019-11-05

Coupled Diffusion Of Impurity Atoms And Point Defects In Silicon Crystals written by Oleg Velichko and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-11-05 with Technology & Engineering categories.

This work presents a comprehensive theory describing atomic diffusion in silicon crystals under strong nonequilibrium conditions caused by ion implantation and interaction with the surface or other interfaces. A set of generalized equations that describe diffusion of impurity atoms and point defects are presented in a form suitable for solving numerically. Based on this theory, partial diffusion models are constructed, and the simulation of many doping processes used in microelectronics is carried out.Coupled Diffusion of Impurity Atoms and Point Defects in Silicon Crystals is a useful text for researchers, engineers, and advanced students in semiconductor physics, microelectronics, and nanoelectronics. It helps readers acquire a deep understanding of the physics of diffusion and demonstrates the practical application of the theoretical ideas formulated to find cheaper solutions in the course of manufacturing semiconductor devices and integrated microcircuits.