Rapid Thermal Processing Of Polysilicon Emitter Transistors
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Rapid Thermal Processing Of Polysilicon Emitter Transistors
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Author : Diane Mauersberg
language : en
Publisher:
Release Date : 1994
Rapid Thermal Processing Of Polysilicon Emitter Transistors written by Diane Mauersberg and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Bipolar transistors categories.
"The recent developments in rapid thermal processing in the past several years have shown it to have much potential in achieving full dopant activation of implanted junctions with a limited amount of junction depth movement. Its application to polysilicon emitter transistors allows for the formation of very shallow emitter-base junctions and narrow base widths with far greater activation capability than conventional furnace processes. A process for polysilicon emiter transistors utilizing rapid thermal annealing has been developed. Furnace processing at 875 C; and rapid thermal processing for 20 seconds at 950 C, 1000 C, and 1050 C was performed to anneal the emitter. Vertical npn transistors with emitter junctions of .1 to .2 microns and base widths smaller than .2 microns were fabricated. The resulting gains were as high as 392 with corresponding early voltages of 165 volts. TEM analysis was also performed to show the effects of RTP."--Abstract.
Rapid Thermal Processing
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Author : Richard B. Fair
language : en
Publisher: Academic Press
Release Date : 2012-12-02
Rapid Thermal Processing written by Richard B. Fair and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.
This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Emitter Resistance And Current Gain In Rapid Thermal Annealed Polysilicon Emitter Transistors
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Author : Gary Francis Mackay
language : en
Publisher:
Release Date : 1991
Emitter Resistance And Current Gain In Rapid Thermal Annealed Polysilicon Emitter Transistors written by Gary Francis Mackay and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991 with categories.
Advances In Rapid Thermal Processing
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 1999
Advances In Rapid Thermal Processing written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Technology & Engineering categories.
Rapid Thermal Processing Of Electronic Materials Volume 92
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Author : Syd R. Wilson
language : en
Publisher:
Release Date : 1987-10
Rapid Thermal Processing Of Electronic Materials Volume 92 written by Syd R. Wilson and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1987-10 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Rapid Thermal And Other Short Time Processing Technologies Ii
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Author : Dim-Lee Kwong
language : en
Publisher: The Electrochemical Society
Release Date : 2001
Rapid Thermal And Other Short Time Processing Technologies Ii written by Dim-Lee Kwong and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Technology & Engineering categories.
"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Rapid Thermal Annealing Chemical Vapor Deposition And Integrated Processing Volume 146
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Author : David Hodul
language : en
Publisher:
Release Date : 1989-11-03
Rapid Thermal Annealing Chemical Vapor Deposition And Integrated Processing Volume 146 written by David Hodul and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989-11-03 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Rapid Thermal Processing Of Semiconductors
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Author : Victor E. Borisenko
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-22
Rapid Thermal Processing Of Semiconductors written by Victor E. Borisenko and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-22 with Technology & Engineering categories.
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Low Temperature Polysilicon Thin Film Transistors In Advanced Display Technologies
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Author :
language : en
Publisher:
Release Date : 2000
Low Temperature Polysilicon Thin Film Transistors In Advanced Display Technologies written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with categories.
In this final project report, we detail the work completed in developing a polysilicon thin film transistor (TFT) technology that was successfully applied in fabricating a working VGA Active Matrix Organic Light Emitting Diode (AMOLED) display prototype. Using the high throughput, low cost method of Rapid Thermal Processing (RTP), we achieved glass compatible crystallization temperatures of polysilicon. We identify that RTP results in superior TFT performance uniformity, which is critical for fabrication of AMOLEDs. We successfully developed and integrated novel microelectronic processes and techniques while fabricating AMOLED displays, culminating in the demonstration of a VGA AMOLED prototype display operated at a brightness of 101 nits. Using our high throughput, low cost process polysilicon TFT technology, we fabricated display driver circuits, including low temperature shift registers that run at clock frequencies as high as 20 MHz. Finally, several processing issues that were investigated in order to improve the performance of AMOLED displays are described. This includes work on low temperature silicides for TFTs, a novel hillock-free aluminum metallization, and the ability of this aluminum metallization to form ohmic contacts to indium tin oxide.
Rapid Thermal Processing And Beyond Applications In Semiconductor Processing
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Author : Wielfried Lerch
language : en
Publisher: Trans Tech Publications Ltd
Release Date : 2008-03-24
Rapid Thermal Processing And Beyond Applications In Semiconductor Processing written by Wielfried Lerch and has been published by Trans Tech Publications Ltd this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-03-24 with Technology & Engineering categories.
Heat-treatment and thermal annealing are very common processing steps which have been employed during semiconductor manufacturing right from the beginning of integrated circuit technology. In order to minimize undesired diffusion, and other thermal budget-dependent effects, the trend has been to reduce the annealing time sharply by switching from standard furnace batch-processing (involving several hours or even days), to rapid thermal processing involving soaking times of just a few seconds. This transition from thermal equilibrium, to highly non-equilibrium, processing was very challenging and is still a field ripe for further development.