Rapid Thermal Processing
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Rapid Thermal Processing
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Author : Richard B. Fair
language : en
Publisher: Academic Press
Release Date : 2012-12-02
Rapid Thermal Processing written by Richard B. Fair and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.
This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Rapid Thermal Processing And Beyond Applications In Semiconductor Processing
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Author : Wielfried Lerch
language : en
Publisher: Trans Tech Publications Ltd
Release Date : 2008-03-24
Rapid Thermal Processing And Beyond Applications In Semiconductor Processing written by Wielfried Lerch and has been published by Trans Tech Publications Ltd this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-03-24 with Technology & Engineering categories.
Special topic volume with invited papers only
Advances In Rapid Thermal Processing
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 1999
Advances In Rapid Thermal Processing written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Technology & Engineering categories.
Rapid Thermal Processing
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Author : A. Slaoui
language : en
Publisher: Elsevier Science
Release Date : 1999-03-17
Rapid Thermal Processing written by A. Slaoui and has been published by Elsevier Science this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-03-17 with Science categories.
Rapid Thermal Processing (RTP) is a well established single-wafer technology in USLI semiconductor manufacturing and electrical engineering, as well as in materials science. The biggest advantage of RTP is that it eliminates the long-ramp-up and ramp-down times associated with furnaces, enabling a significant reduction in the thermal budget. Today, RTP is in production use for source/drain implant annealing, contact alloying, formation of refractory nitrides and silicides and thin gate dielectric (oxide) formation. The aim of Symposium I was to provide an overview of the latest information on research and development in the different topics cited above. The potential applications of RTP in new areas like large area devices such as flat planel displays and solar cells has to be investigated. About 30 papers were presented in this symposium. The contributions of most interest involved modelling and control, junctions formation and thermal oxidation, deposition and recrystallisation and silicide formations. However, the range of topics and the intent to focus on underlying, fundamental issues like dopant diffusion in silicon from solid sources, strain relaxation and photonic effects, nucleation as well as applications to magnetic films and solar cells devices.
Rapid Thermal Processing Of Semiconductors
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Author : Victor E. Borisenko
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-22
Rapid Thermal Processing Of Semiconductors written by Victor E. Borisenko and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-22 with Technology & Engineering categories.
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Advances In Rapid Thermal And Integrated Processing
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Author : F. Roozeboom
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Advances In Rapid Thermal And Integrated Processing written by F. Roozeboom and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Science categories.
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Rapid Thermal Processing For Future Semiconductor Devices
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Author : H. Fukuda
language : en
Publisher: Elsevier
Release Date : 2003-04-02
Rapid Thermal Processing For Future Semiconductor Devices written by H. Fukuda and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-02 with Science categories.
This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices.This book covers the following areas: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.
Rapid Thermal And Other Short Time Processing Technologies Ii
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Author : Dim-Lee Kwong
language : en
Publisher: The Electrochemical Society
Release Date : 2001
Rapid Thermal And Other Short Time Processing Technologies Ii written by Dim-Lee Kwong and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Technology & Engineering categories.
"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Rapid Thermal And Integrated Processing V Volume 429
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Author : J. C. Gelpey
language : en
Publisher:
Release Date : 1996-10-14
Rapid Thermal And Integrated Processing V Volume 429 written by J. C. Gelpey and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-10-14 with Technology & Engineering categories.
This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.