Ulsi Front End Technology Covering From The First Semiconductor Paper To Cmos Finfet Technology
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Ulsi Front End Technology Covering From The First Semiconductor Paper To Cmos Finfet Technology
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Author : Wai Shing Lau
language : en
Publisher: World Scientific
Release Date : 2017-08-23
Ulsi Front End Technology Covering From The First Semiconductor Paper To Cmos Finfet Technology written by Wai Shing Lau and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-08-23 with Technology & Engineering categories.
The main focus of this book is ULSI front-end technology. It covers from the early history of semiconductor science & technology from 1874 to state-of-the-art FINFET technology in 2016. Some ULSI back-end technology is also covered, for example, the science and technology of MIM capacitors for analog CMOS has been included in this book.
Ulsi Front End Technology
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Author : Lau Wai Shing
language : en
Publisher:
Release Date : 2017
Ulsi Front End Technology written by Lau Wai Shing and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017 with Integrated circuits categories.
"The main focus of this book is ULSI front-end technology. It covers from the early history of semiconductor science & technology from 1874 to state-of-the-art FINFET technology in 2016. Some ULSI back-end technology is also covered, for example, the science and technology of MIM capacitors for analog CMOS has been included in this book."--Publisher's website.
Ulsi Front End Technology Covering From The First Scientific Paper On Semiconductor To State Of The Art Cmos Finfet Technology
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Author : Wai Shing Lau
language : en
Publisher: World Scientific Publishing Company
Release Date : 2017-06-29
Ulsi Front End Technology Covering From The First Scientific Paper On Semiconductor To State Of The Art Cmos Finfet Technology written by Wai Shing Lau and has been published by World Scientific Publishing Company this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-06-29 with Technology & Engineering categories.
This collection of essays documents and investigates the conflicts in the European, Russia and China that sparked populist revolts against the established globalist order in the European Union. It shows that the populist surge was not an anomaly. It was a
Cmos Front End Materials And Process Technology Volume 765
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-09-12
Cmos Front End Materials And Process Technology Volume 765 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-09-12 with Computers categories.
In the future, because fundamental materials and process limits are being approached, continued transistor scaling will not be as straightforward. Future complementary metal-oxide semiconductor (MOS) transistors will require high-permittivity (high-k) gate dielectrics and metal gate electrodes, as well as low-resistance ultrashallow junctions, in order to meet the stringent specifications of the International Technology Roadmap for Semiconductors. Techniques to improve transconductance and drive current may also be required. Process integration issues must be solved, and reliability must be assured, before any new material or processing technique can be used in IC manufacture. A further complication is that the key challenges will differ according to application. This book reports research results from industry, government labs and academia covering a wide scope of front-end process issues for future CMOS technologies. Topics include: advanced materials and structures; high-k dielectrics; advanced gate stack materials; heterogeneous integration and strained Si technologies; ultrashallow junction technology; strained Si and source/drain technology; and laser annealing and silicide processes.
Finfet Devices For Vlsi Circuits And Systems
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Author : Samar K. Saha
language : en
Publisher: CRC Press
Release Date : 2020-07-15
Finfet Devices For Vlsi Circuits And Systems written by Samar K. Saha and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-07-15 with Technology & Engineering categories.
To surmount the continuous scaling challenges of MOSFET devices, FinFETs have emerged as the real alternative for use as the next generation device for IC fabrication technology. The objective of this book is to provide the basic theory and operating principles of FinFET devices and technology, an overview of FinFET device architecture and manufacturing processes, and detailed formulation of FinFET electrostatic and dynamic device characteristics for IC design and manufacturing. Thus, this book caters to practicing engineers transitioning to FinFET technology and prepares the next generation of device engineers and academic experts on mainstream device technology at the nanometer-nodes.
Ulsi Process Integration 5
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Author : Cor L. Claeys
language : en
Publisher: The Electrochemical Society
Release Date : 2007
Ulsi Process Integration 5 written by Cor L. Claeys and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Technology & Engineering categories.
The symposium provided a forum for reviewing and discussing all aspects of process integration, with special focus on nanoscaled technologies, 65 nm and beyond on DRAM, SRAM, flash memory, high density logic-low power, RF, mixed analog-digital, process integration yield, CMP chemistries, low-k processes, gate stacks, metal gates, rapid thermal processing, silicides, copper interconnects, carbon nanotubes, novel materials, high mobility substrates (SOI, sSi, SiGe, GeOI), strain engineering, and hybrid integration.
Ulsi Technology
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Author : C. Y. Chang
language : en
Publisher: McGraw-Hill Book Company Limited
Release Date : 1996
Ulsi Technology written by C. Y. Chang and has been published by McGraw-Hill Book Company Limited this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Computers categories.
Presents topics useful for the next generation of USLI technologies, allowing more transistors to be packaged on a single chip. This book contains contributions from industry experts, specializing in topics such as epitaxy with low temperature process, rapid thermal processes, low damage plasma reactive ion etching, and fine line lithography.