Yield Aware Analog Ic Design And Optimization In Nanometer Scale Technologies
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Yield Aware Analog Ic Design And Optimization In Nanometer Scale Technologies
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Author : António Manuel Lourenço Canelas
language : en
Publisher: Springer Nature
Release Date : 2020-03-20
Yield Aware Analog Ic Design And Optimization In Nanometer Scale Technologies written by António Manuel Lourenço Canelas and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-03-20 with Technology & Engineering categories.
This book presents a new methodology with reduced time impact to address the problem of analog integrated circuit (IC) yield estimation by means of Monte Carlo (MC) analysis, inside an optimization loop of a population-based algorithm. The low time impact on the overall optimization processes enables IC designers to perform yield optimization with the most accurate yield estimation method, MC simulations using foundry statistical device models considering local and global variations. The methodology described by the authors delivers on average a reduction of 89% in the total number of MC simulations, when compared to the exhaustive MC analysis over the full population. In addition to describing a newly developed yield estimation technique, the authors also provide detailed background on automatic analog IC sizing and optimization.
Nano Scale Cmos Analog Circuits
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Author : Soumya Pandit
language : en
Publisher: CRC Press
Release Date : 2018-09-03
Nano Scale Cmos Analog Circuits written by Soumya Pandit and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-09-03 with Technology & Engineering categories.
Reliability concerns and the limitations of process technology can sometimes restrict the innovation process involved in designing nano-scale analog circuits. The success of nano-scale analog circuit design requires repeat experimentation, correct analysis of the device physics, process technology, and adequate use of the knowledge database. Starting with the basics, Nano-Scale CMOS Analog Circuits: Models and CAD Techniques for High-Level Design introduces the essential fundamental concepts for designing analog circuits with optimal performances. This book explains the links between the physics and technology of scaled MOS transistors and the design and simulation of nano-scale analog circuits. It also explores the development of structured computer-aided design (CAD) techniques for architecture-level and circuit-level design of analog circuits. The book outlines the general trends of technology scaling with respect to device geometry, process parameters, and supply voltage. It describes models and optimization techniques, as well as the compact modeling of scaled MOS transistors for VLSI circuit simulation. • Includes two learning-based methods: the artificial neural network (ANN) and the least-squares support vector machine (LS-SVM) method • Provides case studies demonstrating the practical use of these two methods • Explores circuit sizing and specification translation tasks • Introduces the particle swarm optimization technique and provides examples of sizing analog circuits • Discusses the advanced effects of scaled MOS transistors like narrow width effects, and vertical and lateral channel engineering Nano-Scale CMOS Analog Circuits: Models and CAD Techniques for High-Level Design describes the models and CAD techniques, explores the physics of MOS transistors, and considers the design challenges involving statistical variations of process technology parameters and reliability constraints related to circuit design.
Handbook Of Research On Applied Optimization Methodologies In Manufacturing Systems
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Author : Faruk Y?lmaz, Ömer
language : en
Publisher: IGI Global
Release Date : 2017-11-30
Handbook Of Research On Applied Optimization Methodologies In Manufacturing Systems written by Faruk Y?lmaz, Ömer and has been published by IGI Global this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-11-30 with Business & Economics categories.
Today’s manufacturing systems are undergoing significant changes in the aspects of planning, production execution, and delivery. It is imperative to stay up-to-date on the latest trends in optimization to efficiently create products for the market. The Handbook of Research on Applied Optimization Methodologies in Manufacturing Systems is a pivotal reference source including the latest scholarly research on heuristic models for solving manufacturing and supply chain related problems. Featuring exhaustive coverage on a broad range of topics such as assembly ratio, car sequencing, and color constraints, this publication is ideally designed for practitioners seeking new comprehensive models for problem solving in manufacturing and supply chain management.
Integrated Circuit And System Design Power And Timing Modeling Optimization And Simulation
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Author : Nadine Azemard
language : en
Publisher: Springer Science & Business Media
Release Date : 2007-08-21
Integrated Circuit And System Design Power And Timing Modeling Optimization And Simulation written by Nadine Azemard and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-08-21 with Computers categories.
This volume features the refereed proceedings of the 17th International Workshop on Power and Timing Modeling, Optimization and Simulation. Papers cover high level design, low power design techniques, low power analog circuits, statistical static timing analysis, power modeling and optimization, low power routing optimization, security and asynchronous design, low power applications, modeling and optimization, and more.
Circuit Technology Co Optimization Of Sram Design In Advanced Cmos Nodes
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Author : Hsiao-Hsuan Liu
language : en
Publisher: Springer Nature
Release Date : 2024-12-20
Circuit Technology Co Optimization Of Sram Design In Advanced Cmos Nodes written by Hsiao-Hsuan Liu and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-12-20 with Computers categories.
Modern computing engines—CPUs, GPUs, and NPUs—require extensive SRAM for cache designs, driven by the increasing demand for higher density, performance, and energy efficiency. This book delves into two primary areas within ultra-scaled technology nodes: (1) advancing SRAM bitcell scaling and (2) exploring innovative subarray designs to enhance power-performance-area (PPA) metrics across technology nodes. The first part of the book utilizes a bottom-up design-technology co-optimization (DTCO) approach, employing a dedicated PPA simulation framework to evaluate and identify the most promising strategies for SRAM bitcell scaling. It offers a comprehensive examination of SRAM bitcell scaling beyond 1 nm node, outlining a structured research cycle that includes identifying scaling bottlenecks, developing cutting-edge architectures with complementary field-effect transistor (CFET) technology, and addressing challenges such as process integration and routing complexities. Additionally, this book introduces a novel write margin methodology to better address the risks of write failures in resistance-dominated nodes. This methodology accounts for time-dependent parasitic bitline effects and incorporates timing setup of write-assist techniques to prevent underestimating the yield loss. In the second part, the focus shifts to a top-down DTCO approach due to the diminishing returns of bitcell scaling beyond 5 Å node at the macro level. As technology scales, increasing resistance and capacitance (RC) lead designers to adopt smaller subarray sizes to reduce effective RC and enhance subarray-level PPA. However, this approach can result in increased inter-subarray interconnect overhead, potentially offsetting macro-level improvements. This book examines the effects of various subarray sizes on macro-level PPA and finds that larger subarrays can significantly reduce interconnect overhead and improve the energy-delay-area product (EDAP) of SRAM macro. The introduction of the active interconnect (AIC) concept enables the use of larger subarray sizes, while integrating carbon nanotube FET as back-end-of-line compatible devices results in macro-level EDAP improvements of up to 65% when transitioning from standard subarrays to AIC divided subarrays. These findings highlight the future trajectory of SRAM subarray design in deeply scaled nodes.
Microlithography
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Author : Bruce W. Smith
language : en
Publisher: CRC Press
Release Date : 2020-05-01
Microlithography written by Bruce W. Smith and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-05-01 with Technology & Engineering categories.
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Design For Manufacturability And Yield For Nano Scale Cmos
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Author : Charles Chiang
language : en
Publisher: Springer Science & Business Media
Release Date : 2007-06-15
Design For Manufacturability And Yield For Nano Scale Cmos written by Charles Chiang and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-06-15 with Technology & Engineering categories.
This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
Timing Performance Of Nanometer Digital Circuits Under Process Variations
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Author : Victor Champac
language : en
Publisher: Springer
Release Date : 2018-04-18
Timing Performance Of Nanometer Digital Circuits Under Process Variations written by Victor Champac and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-04-18 with Technology & Engineering categories.
This book discusses the digital design of integrated circuits under process variations, with a focus on design-time solutions. The authors describe a step-by-step methodology, going from logic gates to logic paths to the circuit level. Topics are presented in comprehensively, without overwhelming use of analytical formulations. Emphasis is placed on providing digital designers with understanding of the sources of process variations, their impact on circuit performance and tools for improving their designs to comply with product specifications. Various circuit-level “design hints” are highlighted, so that readers can use then to improve their designs. A special treatment is devoted to unique design issues and the impact of process variations on the performance of FinFET based circuits. This book enables readers to make optimal decisions at design time, toward more efficient circuits, with better yield and higher reliability.
Boogarlists Directory Of Electronics Technologies
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Author :
language : en
Publisher: BoogarLists
Release Date :
Boogarlists Directory Of Electronics Technologies written by and has been published by BoogarLists this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.
Managing Temperature Effects In Nanoscale Adaptive Systems
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Author : David Wolpert
language : en
Publisher: Springer Science & Business Media
Release Date : 2011-08-31
Managing Temperature Effects In Nanoscale Adaptive Systems written by David Wolpert and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-08-31 with Technology & Engineering categories.
This book discusses new techniques for detecting, controlling, and exploiting the impacts of temperature variations on nanoscale circuits and systems. A new sensor system is described that can determine the temperature dependence as well as the operating temperature to improve system reliability. A new method is presented to control a circuit’s temperature dependence by individually tuning pull-up and pull-down networks to their temperature-insensitive operating points. This method extends the range of supply voltages that can be made temperature-insensitive, achieving insensitivity at nominal voltage for the first time.