Structure And Electronic Properties Of Ultrathin Dielectric Films On Silicon And Related Structures
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Structure And Electronic Properties Of Ultrathin Dielectric Films On Silicon And Related Structures
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Author :
language : en
Publisher:
Release Date : 1999
Structure And Electronic Properties Of Ultrathin Dielectric Films On Silicon And Related Structures written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Dielectric films categories.
Structure And Electronic Properties Of Ultrathin Dielectric Films On Silicon And Related Structures Volume 592
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Author : D. A. Buchanan
language : en
Publisher:
Release Date : 2000-10-17
Structure And Electronic Properties Of Ultrathin Dielectric Films On Silicon And Related Structures Volume 592 written by D. A. Buchanan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-10-17 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. The book, first published in 2000, includes detailed theoretical studies of the nature of SiO2 and its interface with silicon, electron paramagnetic resonance for the study of defects, electron tunneling, and band alignment among others.
Structure And Electronic Properties Of Ultrathin Dielectric Films On Silicon And Related Structures
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Author : D. A. Buchanan
language : en
Publisher: Cambridge University Press
Release Date : 2014-06-05
Structure And Electronic Properties Of Ultrathin Dielectric Films On Silicon And Related Structures written by D. A. Buchanan and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-06-05 with Technology & Engineering categories.
With the ever-decreasing dimension, laterally and vertically, in CMOS and DRAM technology, the understanding of thin insulators and their interfaces with silicon have become of critical importance. As a result of this scaling of semiconductor devices, an increased interest from industrial, government, and university laboratories has become evident in this field of study. The book, first published in 2000, includes detailed theoretical studies of the nature of SiO2 and its interface with silicon, electron paramagnetic resonance for the study of defects, electron tunneling, and band alignment among others. There are also studies developing new techniques and advancing our understanding of these dielectrics and interfaces, including addressing the issue of dielectric breakdown. Aside from the work addressing SiO2, there are a number of papers regarding the application of the so-called 'high-k' dielectrics. The high-k materials addressed in the volume include such films as Ta2O5, HfO2, Bi2Ti2O7, CeO2, and ZrO2.
Silicon Nitride Silicon Dioxide Thin Insulating Films And Other Emerging Diele C Trics Viii
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Author : Ram Ekwal Sah
language : en
Publisher: The Electrochemical Society
Release Date : 2005
Silicon Nitride Silicon Dioxide Thin Insulating Films And Other Emerging Diele C Trics Viii written by Ram Ekwal Sah and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Nature categories.
Oxide Reliability A Summary Of Silicon Oxide Wearout Breakdown And Reliability
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Author : David J Dumin
language : en
Publisher: World Scientific
Release Date : 2002-01-18
Oxide Reliability A Summary Of Silicon Oxide Wearout Breakdown And Reliability written by David J Dumin and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002-01-18 with Technology & Engineering categories.
This book presents in summary the state of our knowledge of oxide reliability. The articles have been written by experts who are among the most knowledgeable in the field. The book will be an invaluable aid to reliability engineers and manufacturing engineers, helping them to produce and characterize reliable oxides. It can be used as an introduction for new engineers interested in oxide reliability, besides being a reference for engineers already engaged in the field.
Fundamental Aspects Of Ultrathin Dielectrics On Si Based Devices
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Author : Eric Garfunkel
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Fundamental Aspects Of Ultrathin Dielectrics On Si Based Devices written by Eric Garfunkel and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.
International Journal Of Powder Metallurgy
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Author :
language : en
Publisher:
Release Date : 1999
International Journal Of Powder Metallurgy written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Powder metallurgy categories.
The Physics And Chemistry Of Sio2 And The Si Sio2 Interface 3 1996
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Author : Hisham Z. Massoud
language : en
Publisher:
Release Date : 1996
The Physics And Chemistry Of Sio2 And The Si Sio2 Interface 3 1996 written by Hisham Z. Massoud and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Science categories.
Rapid Thermal And Other Short Time Processing Technologies
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 2000
Rapid Thermal And Other Short Time Processing Technologies written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.
The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.
Non Crystalline Films For Device Structures
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Author :
language : en
Publisher: Elsevier
Release Date : 2001-12-11
Non Crystalline Films For Device Structures written by and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-12-11 with Science categories.
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.