Plasma Etching And Reactive Ion Etching
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Plasma Etching And Reactive Ion Etching
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Author : J. W. Coburn
language : en
Publisher:
Release Date : 1982
Plasma Etching And Reactive Ion Etching written by J. W. Coburn and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1982 with Technology & Engineering categories.
Dry Etching For Microelectronics
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Author : R.A. Powell
language : en
Publisher: Elsevier
Release Date : 2012-12-02
Dry Etching For Microelectronics written by R.A. Powell and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.
This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.
Plasma Processing
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Author : R. G. Frieser
language : en
Publisher:
Release Date : 1981
Plasma Processing written by R. G. Frieser and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1981 with Plasma engineering categories.
Encyclopedia Of Microfluidics And Nanofluidics
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Author : Dongqing Li
language : en
Publisher: Springer Science & Business Media
Release Date : 2008-08-06
Encyclopedia Of Microfluidics And Nanofluidics written by Dongqing Li and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-08-06 with Technology & Engineering categories.
Covering all aspects of transport phenomena on the nano- and micro-scale, this encyclopedia features over 750 entries in three alphabetically-arranged volumes including the most up-to-date research, insights, and applied techniques across all areas. Coverage includes electrical double-layers, optofluidics, DNC lab-on-a-chip, nanosensors, and more.
Plasma Etching
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Author : M. Sugawara
language : en
Publisher: OUP Oxford
Release Date : 1998-05-28
Plasma Etching written by M. Sugawara and has been published by OUP Oxford this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-05-28 with Technology & Engineering categories.
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Atomic Layer Processing
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Author : Thorsten Lill
language : en
Publisher: John Wiley & Sons
Release Date : 2021-06-28
Atomic Layer Processing written by Thorsten Lill and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-06-28 with Technology & Engineering categories.
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Ion Beam Etching And Reactive Ion Etching On Sbn Thin Films On Mgo Crystal
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Author : Yoo-Mi Lee
language : en
Publisher:
Release Date : 1995
Ion Beam Etching And Reactive Ion Etching On Sbn Thin Films On Mgo Crystal written by Yoo-Mi Lee and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with categories.
Dry Etching For Vlsi
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Author : A.J. van Roosmalen
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-06-29
Dry Etching For Vlsi written by A.J. van Roosmalen and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-06-29 with Science categories.
This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.
Glow Discharge Processes
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Author : Brian Chapman
language : en
Publisher: Wiley-Interscience
Release Date : 1980
Glow Discharge Processes written by Brian Chapman and has been published by Wiley-Interscience this book supported file pdf, txt, epub, kindle and other format this book has been release on 1980 with Science categories.
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
Reactive Ion Beam Etching Of Aluminum 4 Copper Thin Films And Diamond
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Author : Timothy John Whetten
language : en
Publisher:
Release Date : 1986
Reactive Ion Beam Etching Of Aluminum 4 Copper Thin Films And Diamond written by Timothy John Whetten and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1986 with Aluminum-copper alloys categories.