Silicon Carbide 2002 Materials Processing And Devices Volume 742
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Silicon Carbide 2002 Materials Processing And Devices Volume 742
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Author : Stephen E. Saddow
language : en
Publisher:
Release Date : 2003-03-25
Silicon Carbide 2002 Materials Processing And Devices Volume 742 written by Stephen E. Saddow and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-03-25 with Technology & Engineering categories.
Advances in silicon carbide materials, processing and device design have recently resulted in implementation of SiC-based electronic systems and offer great promise in high-voltage, high-temperature and high-frequency applications. This volume focuses on new developments in basic science of SiC materials as well as rapidly maturing device technologies. The challenges in this field include understanding and decreasing defect densities in bulk SiC crystals, controlling morphology and residual impurities in epilayers, optimization of implant activation and oxide-SiC interfaces, and developing novel device structures. This book brings together the crystal growers, physicists and device experts needed to continue the rapid pace of silicon-carbide-based technology. Topics include: epitaxial growth; characterization/defects; MOS technology; SiC processing and devices.
Advanced Processing And Manufacturing Technologies For Structural And Multifunctional Materials Iv
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Author : Tatsuki Ohji
language : en
Publisher: John Wiley & Sons
Release Date : 2010-11-23
Advanced Processing And Manufacturing Technologies For Structural And Multifunctional Materials Iv written by Tatsuki Ohji and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-11-23 with Technology & Engineering categories.
This issue contains 25 invited and contributed papers, all peer reviewed according to the American Ceramic Society Review Process. The latest developments in processing and manufacturing technologies are covered, including green manufacturing, smart processing, advanced composite manufacturing, rapid processing, joining, machining, and net shape forming technologies. These papers discuss the most important aspects necessary for understanding and further development of processing and manufacturing of ceramic materials and systems.
Silicon Carbide Materials Processing And Devices
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Author :
language : en
Publisher:
Release Date : 2002
Silicon Carbide Materials Processing And Devices written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Semiconductors categories.
Integration Of Heterogeneous Thin Films Materials And Devices Volume 768
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-07-28
Integration Of Heterogeneous Thin Films Materials And Devices Volume 768 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-07-28 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2003, addresses the science, engineering innovations and applications of multimaterial integration. Topics range from heteroepitaxy to wafer bonding and layer transfer.
Silicon Carbide 2004 Materials Processing And Devices Volume 815
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2004-08-24
Silicon Carbide 2004 Materials Processing And Devices Volume 815 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004-08-24 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Novel Materials And Processes For Advanced Cmos Volume 745
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Author : Mark I. Gardner
language : en
Publisher:
Release Date : 2003-03-25
Novel Materials And Processes For Advanced Cmos Volume 745 written by Mark I. Gardner and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-03-25 with Computers categories.
Progress in MOS integrated-circuit technology is largely driven by the ability to dimensionally scale the constituent components of individual devices and their associated interconnections. Given a set of materials with fixed properties, this scaling is finite and its predicted limits are rapidly approaching. The International Technology Roadmap for Semiconductors establishes the pace at which this scaling occurs and identifies many of the technological challenges ahead. This volume assembles representatives from the fields of materials science, physics, electrical and chemical engineering to provide an insightful review of current technology and understanding. Specifically, the intent is to discuss materials issues stemming from device scaling to sub-100nm technology nodes. Topics include: high-k characterization; atomic layer deposition; gate metal materials and integration; contacts and ultrashallow junction formation; theory and modeling and crystalline oxides for gate dielectrics.
Gan And Related Alloys 2002 Volume 743
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-06-02
Gan And Related Alloys 2002 Volume 743 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-06-02 with Science categories.
This year's nitride symposium showed the scope of nitride-related advances spanning basic materials physics over process technology to high-performance devices. Progress was reported in bulk growth of GaN and AlN, growth on various substrates and substrate orientations, optical properties of InN, defect and doping analysis of p-doped GaN, and polarization properties. These led to new performance records in visible light emitter technology, i.e., higher efficiency/higher brightness, UV emitters with shorter wavelength, and UV and photo detectors. Advances in the development of nitride-based electronic devices with new heterostructure FET designs for RF power applications, including those on Si substrates and wafer fusion, are also reported. This book captures the exciting developments in this rapidly progressing field. Topics include: epitaxy - devices and defect reduction; defects and characterization; epitaxy - nonpolar orientations and alloys; optical properties; UV emitters and detectors; visible light emitters; electronic devices; characterization of defects and transport; and contacts, processing and p-type nitrides.
Cmos Front End Materials And Process Technology Volume 765
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-09-12
Cmos Front End Materials And Process Technology Volume 765 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-09-12 with Computers categories.
In the future, because fundamental materials and process limits are being approached, continued transistor scaling will not be as straightforward. Future complementary metal-oxide semiconductor (MOS) transistors will require high-permittivity (high-k) gate dielectrics and metal gate electrodes, as well as low-resistance ultrashallow junctions, in order to meet the stringent specifications of the International Technology Roadmap for Semiconductors. Techniques to improve transconductance and drive current may also be required. Process integration issues must be solved, and reliability must be assured, before any new material or processing technique can be used in IC manufacture. A further complication is that the key challenges will differ according to application. This book reports research results from industry, government labs and academia covering a wide scope of front-end process issues for future CMOS technologies. Topics include: advanced materials and structures; high-k dielectrics; advanced gate stack materials; heterogeneous integration and strained Si technologies; ultrashallow junction technology; strained Si and source/drain technology; and laser annealing and silicide processes.
Surface Engineering 2002 Synthesis Characterization And Applications Volume 750
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Author : A. Kumar
language : en
Publisher:
Release Date : 2003-06-02
Surface Engineering 2002 Synthesis Characterization And Applications Volume 750 written by A. Kumar and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-06-02 with Technology & Engineering categories.
This book provides a forum for international and interdisciplinary discussion of phenomena where materials performance may be enhanced through engineered surfaces and interfaces. The materials science of hard and wear-resistant coatings, including nanostructured coatings, is a scientifically challenging problem with immediate technological applications in machine and machining tools, magnetic recording and other manufacturing industries. Hard coating systems designed for use in next-generation materials applications must achieve a combination of physical properties. The performance and reliability of MEMS devices strongly depend on the near-surface properties and many materials issues at the micro- and nanoscale remain to be resolved. This book reviews key aspects, discusses ongoing research and speculates on future trends. Topics include: nano- and micrometer-scale characterization and properties; synthesis and characterization of nanostructured materials; deposition, characterization and properties of films and coatings; industrial applications of surface engineering; atomistic and continuum modeling of materials properties; surface engineering issues for bio/microelectronics applications; and surface engineering issues in MEMS structures and devices.
Advanced Optical Processing Of Materials
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003
Advanced Optical Processing Of Materials written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Technology & Engineering categories.
Since the inauguration of the MRS symposium series on advanced optical processing of materials back in 1990, the number of optical-based techniques applied to process materials and the capabilities of optical systems has continued to expand and improve beyond simple pulsed-laser deposition of thin films. In turn, the scope of materials being investigated has also increased from oxide ceramics to include alloys, polymers and bio-materials. Many of the most exciting areas presented in this interdisciplinary forum include current and future applications in engineering materials at the mesoscopic-to-nanometer scale, optoelectronics, biomaterials, sensors and electronics. Advanced optical processing of materials now includes laser interactions with materials that are specially designed to optimize the beneficial qualities of laser modification. However, femtosecond processing of materials emerged as the dominant theme this year and several papers on this topic are featured. Another hot topic is one connected with biomedical applications--the controlled delivery of drugs to increase their efficacy by coating a fluidized bed of drug powders with biodegradable polymers was realized by conventional pulsed-laser deposition (PLD) and matrix assisted pulsed-laser evaporation (MAPLE) or by microencapsulation.