Surface Engineering 2002 Synthesis Characterization And Applications Volume 750
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Surface Engineering 2002 Synthesis Characterization And Applications Volume 750
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Author : A. Kumar
language : en
Publisher:
Release Date : 2003-06-02
Surface Engineering 2002 Synthesis Characterization And Applications Volume 750 written by A. Kumar and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-06-02 with Technology & Engineering categories.
This book provides a forum for international and interdisciplinary discussion of phenomena where materials performance may be enhanced through engineered surfaces and interfaces. The materials science of hard and wear-resistant coatings, including nanostructured coatings, is a scientifically challenging problem with immediate technological applications in machine and machining tools, magnetic recording and other manufacturing industries. Hard coating systems designed for use in next-generation materials applications must achieve a combination of physical properties. The performance and reliability of MEMS devices strongly depend on the near-surface properties and many materials issues at the micro- and nanoscale remain to be resolved. This book reviews key aspects, discusses ongoing research and speculates on future trends. Topics include: nano- and micrometer-scale characterization and properties; synthesis and characterization of nanostructured materials; deposition, characterization and properties of films and coatings; industrial applications of surface engineering; atomistic and continuum modeling of materials properties; surface engineering issues for bio/microelectronics applications; and surface engineering issues in MEMS structures and devices.
Surface Engineering
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Author :
language : en
Publisher:
Release Date : 2002
Surface Engineering written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Surfaces (Technology) categories.
Silicon Carbide 2002 Materials Processing And Devices Volume 742
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Author : Stephen E. Saddow
language : en
Publisher:
Release Date : 2003-03-25
Silicon Carbide 2002 Materials Processing And Devices Volume 742 written by Stephen E. Saddow and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-03-25 with Science categories.
Advances in silicon carbide materials, processing and device design have recently resulted in implementation of SiC-based electronic systems and offer great promise in high-voltage, high-temperature and high-frequency applications. This volume focuses on new developments in basic science of SiC materials as well as rapidly maturing device technologies. The challenges in this field include understanding and decreasing defect densities in bulk SiC crystals, controlling morphology and residual impurities in epilayers, optimization of implant activation and oxide-SiC interfaces, and developing novel device structures. This book brings together the crystal growers, physicists and device experts needed to continue the rapid pace of silicon-carbide-based technology. Topics include: epitaxial growth; characterization/defects; MOS technology; SiC processing and devices.
Solid State Ionics 2002 Volume 756
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Author : Philippe Knauth
language : en
Publisher: Cambridge University Press
Release Date : 2003-04-17
Solid State Ionics 2002 Volume 756 written by Philippe Knauth and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-17 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Chemical Mechanical Planarization Volume 767
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Author : Duane S. Boning
language : en
Publisher:
Release Date : 2003-08-27
Chemical Mechanical Planarization Volume 767 written by Duane S. Boning and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-08-27 with Technology & Engineering categories.
Chemical-mechanical planarization (CMP) has emerged as a critical fabrication technology for advanced integrated circuits. Even as the applications of CMP have diversified and we have begun to understand aspects of the physics and chemistry of the process, a new generation of CMP innovations is unfolding. New slurries and consumables are under development. New applications to novel devices continue to appear. This book, the most recent in a successful series on CMP, offers a review of the advances to date and provides a comprehensive discussion of the future challenges that must be overcome. Presentations from academia, government labs and industry are featured. Topics include; CMP modeling; CMP science; CMP slurries and particles for planarization of copper, oxide, and other materials; planarization applications including shallow trench isolation (STI), copper damascene, and novel devices and CMP integration.
Crystalline Oxide Volume 747
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Author : D. G. Schlom
language : en
Publisher:
Release Date : 2003-06-23
Crystalline Oxide Volume 747 written by D. G. Schlom and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-06-23 with Technology & Engineering categories.
This book contains the proceedings of two symposia held at the 2002 MRS Fall Meeting in Boston. Papers from Symposium T, Crystalline Oxides on Semiconductors, bring together experts from different technology areas - high-k gate dielectrics, novel memories, and ferroelectrics, for example - to examine commonality among the fields. These papers offer an overview of the field, highlight interesting experimental results and device ideas, and feature innovative theoretical approaches to understanding these systems. Symposium V, Interfacial Issues for Oxide-Based Electronics, covers a wide range of topics involving the interfaces between electro-optical oxide layers and other materials. Overall, it is clear that a new generation of materials and heterostructures has been enabled by the increasing control of interfacial phenomena. Topics include: epitaxial oxide-silicon heterostructures; ferroelectric thin films on silicon; theory and modeling; crystalline oxides for gate dielectrics; transparent conducting oxides; transparent conducting oxides and oxide growth and properties; field effect devices and gate dielectrics; ferroelectrics, capacitors and sensors; organic devices and interfacial growth issues.
Novel Materials And Processes For Advanced Cmos Volume 745
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Author : Mark I. Gardner
language : en
Publisher:
Release Date : 2003-03-25
Novel Materials And Processes For Advanced Cmos Volume 745 written by Mark I. Gardner and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-03-25 with Computers categories.
Progress in MOS integrated-circuit technology is largely driven by the ability to dimensionally scale the constituent components of individual devices and their associated interconnections. Given a set of materials with fixed properties, this scaling is finite and its predicted limits are rapidly approaching. The International Technology Roadmap for Semiconductors establishes the pace at which this scaling occurs and identifies many of the technological challenges ahead. This volume assembles representatives from the fields of materials science, physics, electrical and chemical engineering to provide an insightful review of current technology and understanding. Specifically, the intent is to discuss materials issues stemming from device scaling to sub-100nm technology nodes. Topics include: high-k characterization; atomic layer deposition; gate metal materials and integration; contacts and ultrashallow junction formation; theory and modeling and crystalline oxides for gate dielectrics.
Membranes Volume 752
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-04-11
Membranes Volume 752 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-11 with Technology & Engineering categories.
The objective of this 2003 volume from the Materials Research Society is twofold - to provide an overview of advances in membrane science and technology and to enhance communication among membrane researchers from a variety of disciplines including chemistry, biology, biotechnology, chemical engineering and materials science. Membranes can be used for inert or reactive separations in a variety of fields including gas purification, water treatment, energy storage and conversion, bio-technology and biomedicine. The book brings together scientists involved in the entire spectrum of modern approaches to membrane science and technology to address synthesis, characterization and transport properties and their use in established and emerging applications. Topics include: membrane synthesis and preparation; surface modification and additives; hybrid and composite membranes; membrane characterization; transport phenomena in membranes; charged membranes and ion transfer; gas permeation and separation; pervaporation and vapor permeation; dense membranes for hydrogen separation; applications in biotechnology and biomedicine; and membrane R&D for industrial and emerging applications.
Progress In Semiconductors Ii Electronic And Optoelectronic Applications Volume 744
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Author : B. D. Weaver
language : en
Publisher:
Release Date : 2003-04-16
Progress In Semiconductors Ii Electronic And Optoelectronic Applications Volume 744 written by B. D. Weaver and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-16 with Technology & Engineering categories.
Recent years have witnessed dramatic success in the development of semiconductor materials and related quantum structures for applications in electronics and optoelectronics. Progress has also been made in manufacturable (low cost, high volume) growth and processing of semiconductor materials for such device structures. Novel approaches have been proposed to integrate compound semiconductor devices with conventional silicon processing. This book provides a comprehensive overview of the progress on growth, properties and processing of semiconductor materials and quantum structures, as well to underscore the progress on devices such as transistors, light sources, detectors and modulators. Brought to maturity, these devices will likely see widespread application in infrared imaging, chemical and biological sensing, surveillance, short links, space-based applications, solar cells, high-bandwidth communications, and more. Topics include: electronic devices; Si/Ge devices and technology; zinc oxide and related compounds; emitters, lasers and photovoltaics; nanostructures; innovative materials and devices; detectors; and III-nitride materials and devices.
Silicon Carbide Materials Processing And Devices
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Author :
language : en
Publisher:
Release Date : 2002
Silicon Carbide Materials Processing And Devices written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Semiconductors categories.